ELLIPSOMETRIC AND OPTICAL REFLECTIVITY STUDIES OF REACTIVELY SPUTTERED NBN THIN-FILMS

被引:27
作者
TANABE, K
ASANO, H
KATOH, Y
MICHIKAMI, O
机构
关键词
D O I
10.1063/1.339910
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1733 / 1739
页数:7
相关论文
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[1]   THEORY OF THE UNIVERSAL DEGRADATION OF TC IN HIGH-TEMPERATURE SUPERCONDUCTORS [J].
ANDERSON, PW ;
MUTTALIB, KA ;
RAMAKRISHNAN, TV .
PHYSICAL REVIEW B, 1983, 28 (01) :117-120
[2]   PROPERTIES OF NBN THIN-FILMS DEPOSITED ON AMBIENT-TEMPERATURE SUBSTRATES [J].
BACON, DD ;
ENGLISH, AT ;
NAKAHARA, S ;
PETERS, FG ;
SCHREIBER, H ;
SINCLAIR, WR ;
VANDOVER, RB .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (11) :6509-6516
[3]   SUPERCONDUCTING AND STRUCTURE PROPERTIES OF NIOBIUM NITRIDE PREPARED BY RF MAGNETRON SPUTTERING [J].
CUKAUSKAS, EJ ;
CARTER, WL ;
QADRI, SB .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (07) :2538-2542
[5]   PREPARATION AND SUPERCONDUCTING PROPERTIES OF THIN FILMS OF TRANSITION METAL INTERSTITIAL COMPOUNDS [J].
GAVALER, JR ;
HULM, JK ;
JANOCKO, MA ;
JONES, CK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :177-&
[6]   AR ION-BOMBARDMENT EFFECTS OF NBN/PB JOSEPHSON-JUNCTIONS WITH PLASMA OXIDIZED BARRIERS [J].
HIKITA, M ;
TAKEI, K ;
IGARASHI, M .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7066-7072
[7]   NIOBIUM NITRIDE NIOBIUM JOSEPHSON TUNNEL-JUNCTIONS WITH SPUTTERED AMORPHOUS-SILICON BARRIERS [J].
JILLIE, DW ;
KROGER, H ;
SMITH, LN ;
CUKAUSKAS, EJ ;
NISENOFF, M .
APPLIED PHYSICS LETTERS, 1982, 40 (08) :747-750
[8]   NBN MATERIALS DEVELOPMENT FOR PRACTICAL SUPERCONDUCTING DEVICES [J].
KAMPWIRTH, RT ;
GRAY, KE .
IEEE TRANSACTIONS ON MAGNETICS, 1981, 17 (01) :565-568
[9]   RF REACTIVELY SPUTTERED SUPERCONDUCTING NBNX FILMS [J].
KESKAR, KS ;
YAMASHITA, T ;
ONODERA, Y ;
GOTO, Y ;
ASO, T .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3102-3105
[10]   ALL REFRACTORY NBN/MGO/NBN TUNNEL-JUNCTIONS [J].
LEDUC, HG ;
STERN, JA ;
THAKOOR, S ;
KHANNA, SK .
IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (02) :863-865