DESIGN FOR SILICON INFRARED SENSING MOSFET

被引:11
作者
FORBES, L [1 ]
YEARGAN, JR [1 ]
机构
[1] UNIV ARKANSAS, DEPT ELECT ENGN, FAYETTEVILLE, AR 72701 USA
关键词
D O I
10.1109/T-ED.1974.17950
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:459 / 462
页数:4
相关论文
共 10 条
[1]   APPLICATION OF QUANTUM DEFECT TECHNIQUES TO PHOTOIONIZATION OF IMPURITIES IN SEMICONDUCTORS [J].
BEBB, HB ;
CHAPMAN, RA .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (10) :2087-&
[2]  
CARR WN, 1972, MOSLSI DESIGN APPLIC
[3]  
CRAWFORD RH, 1967, MOSFET CIRCUIT DESIG
[4]   N-CHANNEL ION-IMPLANTED ENHANCEMENT-DEPLETION MOSFETS [J].
FORBES, L .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1973, SC 8 (02) :184-185
[5]  
FORBES L, 1969, 10 U ILL SOL EL LAB, P41
[7]   PROBLEM OF INFRARED TELEVISION-CAMERA TUBES VS INFRARED SCANNERS [J].
HALL, JA .
APPLIED OPTICS, 1971, 10 (04) :838-&
[8]   THERMAL EMISSION RATES OF CARRIERS AT GOLD CENTERS IN SILICON [J].
SAH, CT ;
FORBES, L ;
ROSIER, LI ;
TASCH, AF ;
TOLE, AB .
APPLIED PHYSICS LETTERS, 1969, 15 (05) :145-+
[9]  
SAH CT, 1967, PR INST ELECTR ELECT, V55, P654
[10]   THERMAL AND OPTICAL EMISSION AND CAPTURE RATES AND CROSS SECTIONS OF ELECTRONS AND HOLES AT IMPERFECTION CENTERS IN SEMICONDUCTORS FROM PHOTO AND DARK JUNCTION CURRENT AND CAPACITANCE EXPERIMENTS [J].
SAH, CT ;
FORBES, L ;
ROSIER, LL ;
TASCH, AF .
SOLID-STATE ELECTRONICS, 1970, 13 (06) :759-+