RE-EMISSION COEFFICIENTS OF SI AND SIO2 FILMS DEPOSITED THROUGH RF AND DC SPUTTERING

被引：54

作者：

JONES, RE

STANDLEY, CL

MAISSEL, LI

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 12期

关键词：

D O I：

10.1063/1.1709199

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4656 / &

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