NEW ALUMINUM PRECURSORS FOR MOMBE (CBE) - A COMPARATIVE-STUDY

被引:11
作者
KAMP, M
KONIG, F
MORSCH, G
LUTH, H
机构
[1] Institut für Schicht- und Ionentechnik, Forschungszebtrum Jülich, D- W-5170 Jülich
关键词
D O I
10.1016/0022-0248(92)90375-S
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Recently different new Al precursors have been developed to improve the electrical and optical quality of AlGaAs layers grown by MOMBE (CBE), since AlGaAs layers still suffer from the high incorporation of oxygen and carbon. Three approaches are introduced and results obtained from AlxGa1-xAs layers (0 < x less-than-or-equal-to 1) are discussed. APAH, a double ring structure molecule, was found to yield AlGaAs layers with high contents of carbon and nitrogen. The use of an Alane-adduct decreases impurity concentrations and improves optical properties. However, TIBAl is superior and provides highest PL response together with carrier concentrations below p = 10(16) cm-3. Even though the concept of coordinative saturation is promising, results achieved by TIBAl showed that trialkyls could also be well suited for AlGaAs, assuming that they are properly synthesized.
引用
收藏
页码:124 / 129
页数:6
相关论文
共 14 条
[1]   GROWTH OF HIGH-QUALITY ALGAAS BY METALORGANIC MOLECULAR-BEAM EPITAXY USING TRIMETHYLAMINE ALANE [J].
ABERNATHY, CR ;
JORDAN, AS ;
PEARTON, SJ ;
HOBSON, WS ;
BOHLING, DA ;
MUHR, GT .
APPLIED PHYSICS LETTERS, 1990, 56 (26) :2654-2656
[2]   GAAS, ALAS, AND ALXGA1-XAS - MATERIAL PARAMETERS FOR USE IN RESEARCH AND DEVICE APPLICATIONS [J].
ADACHI, S .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (03) :R1-R29
[3]   LATTICE CONTRACTION DUE TO CARBON DOPING OF GAAS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY [J].
DELYON, TJ ;
WOODALL, JM ;
GOORSKY, MS ;
KIRCHNER, PD .
APPLIED PHYSICS LETTERS, 1990, 56 (11) :1040-1042
[4]   MOCVD OF ALGAAS/GAAS WITH NOVEL GROUP-III COMPOUNDS [J].
FRESE, V ;
REGEL, GK ;
HARDTDEGEN, H ;
BRAUERS, A ;
BALK, P ;
HOSTALEK, M ;
LOKAI, M ;
POHL, L ;
MIKLIS, A ;
WERNER, K .
JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (04) :305-310
[5]   NOVEL ORGANOMETALLIC STARTING MATERIALS FOR GROUP-III-V SEMICONDUCTOR METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION [J].
HOSTALEK, M ;
POHL, L ;
BRAUERS, A ;
BALK, P ;
FRESE, V ;
HARDTDEGEN, H ;
HOVEL, R ;
REGEL, GK ;
MOLASSIOTI, A ;
MOSER, M ;
SCHOLZ, F .
THIN SOLID FILMS, 1989, 174 :1-4
[6]  
ILEGEMS M, 1985, TECHNOLOGY PHYSICS M, P134
[7]  
KONIG F, IN PRESS
[8]  
NOVAK SW, 1988, SECONDARY ION MASS S, V6, P303
[9]   ALLOY BROADENING IN PHOTOLUMINESCENCE SPECTRA OF ALXGA1-XAS [J].
SCHUBERT, EF ;
GOBEL, EO ;
HORIKOSHI, Y ;
PLOOG, K ;
QUEISSER, HJ .
PHYSICAL REVIEW B, 1984, 30 (02) :813-820
[10]   THEORY OF PHOTOLUMINESCENCE LINE-SHAPE DUE TO INTERFACIAL QUALITY IN QUANTUM WELL STRUCTURES [J].
SINGH, J ;
BAJAJ, KK ;
CHAUDHURI, S .
APPLIED PHYSICS LETTERS, 1984, 44 (08) :805-807