STRUCTURAL STUDY ON AMORPHOUS-MICROCRYSTALLINE MIXED-PHASE SI-H FILMS

被引：40

作者：

MATSUDA, A ^{[1
]}

YOSHIDA, T ^{[1
]}

YAMASAKI, S ^{[1
]}

TANAKA, K ^{[1
]}

机构：

[1] TOA NENRYO KK,CHIYODA KU,TOKYO 100,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 06期

关键词：

D O I：

10.1143/JJAP.20.L439

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L439 / L442

页数：4

共 5 条

[1] BORON DOPING OF HYDROGENATED SILICON THIN-FILMS [J].

MATSUDA, A ;

MATSUMURA, M ;

YAMASAKI, S ;

YAMAMOTO, H ;

IMURA, T ;

OKUSHI, H ;

IIZIMA, S ;

TANAKA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) :L183-L186

[2] ELECTRICAL AND STRUCTURAL-PROPERTIES OF PHOSPHOROUS-DOPED GLOW-DISCHARGE SI-F-H AND SI-H FILMS [J].

MATSUDA, A ;

YAMASAKI, S ;

NAKAGAWA, K ;

OKUSHI, H ;

TANAKA, K ;

IIZIMA, S ;

MATSUMURA, M ;

YAMAMOTO, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (06) :L305-L308

[3]

MATSUDA A, 1981, P TOP C TETRAHEDRALL

[4] PROTON MAGNETIC-RESONANCE SPECTRA OF PLASMA-DEPOSITED AMORPHOUS SI-H FILMS [J].

REIMER, JA ;

VAUGHAN, RW ;

KNIGHTS, JC .

PHYSICAL REVIEW LETTERS, 1980, 44 (03) :193-196

[5] OPTICAL, ELECTRICAL AND STRUCTURAL-PROPERTIES OF PLASMA-DEPOSITED AMORPHOUS-SILICON [J].

TANAKA, K ;

NAKAGAWA, K ;

MATSUDA, A ;

MATSUMURA, M ;

YAMAMOTO, H ;

YAMASAKI, S ;

OKUSHI, H ;

IIZIMA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) :267-273

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