SEMICONDUCTOR INTERFACE STUDIES USING CORE AND VALENCE LEVEL PHOTOEMISSION

被引:66
作者
HORN, K
机构
[1] Fritz-Haber-Institut der Max-Planck-Gesellschaft, Berlin 33
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1990年 / 51卷 / 04期
关键词
73.30+y; 73.40Lq; 73.60Cs;
D O I
10.1007/BF00324309
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The application of core and valence level photoelectron spectroscopy to the study of semiconductor heterojunctions and metal-semiconductor interfaces (Schottky barriers) is outlined, with an emphasis on recent results and their explanation in terms of current theories. While the determination of transport barriers (valence band offsets and Schottky barriers) is stressed, the identification of chemical reactions at the interface is also discussed using several examples. Photoemission can precisely determine many important quantities in these junctions; also demonstrated, however, is the disturbing influence of the photoemission process itself through the creation of a surface photovoltage in metal-semiconductor interfaces, and its possible consequences for recent investigations of Schottky barrier heights in metal overlayers on low temperature substrates. © 1990 Springer-Verlag.
引用
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页码:289 / 304
页数:16
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