BAND BENDING IN THE INITIAL-STAGES OF SCHOTTKY-BARRIER FORMATION FOR GALLIUM ON SI(113)

被引:22
作者
ALTHAINZ, P
MYLER, U
JACOBI, K
机构
[1] Fritz-Haber-Institut der Max-Planck-Gesellschaft, D-1000 Berlin 33
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 05期
关键词
D O I
10.1103/PhysRevB.41.2849
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present angle-resolved ultraviolet and soft-x-ray photoelectron spectroscopy results for the Schottky-barrier formation of Ga on p-type Si(113). For the first 0.08 monolayer of Ga, the band bending increases. For higher coverages, it decreases monotonically until it reaches its final value at about 2 monolayers. This change of band bending is found for a Si surface for the first time and supports a recent model calculation. The final barrier height is 0.32±0.10 eV, in good agreement with the values found for low-index surfaces. © 1990 The American Physical Society.
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页码:2849 / 2854
页数:6
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