REDUCTION OF SILICON-ALUMINUM INTERDIFFUSION BY IMPROVED SEMICONDUCTOR SURFACE ORDERING

被引：30

作者：

BRILLSON, LJ ^{[1
]}

SLADE, ML ^{[1
]}

KATNANI, AD ^{[1
]}

KELLY, M ^{[1
]}

MARGARITONDO, G ^{[1
]}

机构：

[1] UNIV WISCONSIN,DEPT PHYS,MADISON,WI 53706

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 01期

关键词：

D O I：

10.1063/1.94574

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：110 / 112

页数：3

共 18 条

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