RF DRIVEN MULTICUSP ION-SOURCE FOR PULSED OR STEADY-STATE ION-BEAM PRODUCTION

被引：19

作者：

LEUNG, KN

BACHMAN, DA

HERZ, PR

MCDONALD, DS

机构：

[1] Lawrence Berkeley Laboratory, University of California, Berkeley

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 74卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(93)95063-B

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An rf driven multicusp source has been operated in both cw and pulsed mode to generate H- and various types of positive ion beams. For inert gas plasmas such as He, Ne, AT, Kr and Xe, the extractable current density is higher than 1 A/cm2. When diatomic gases, such as H-2, N2 and O2, are used for the discharge, the extracted beam contains almost pure atomic ions. Thus, simple accelerator or plasma processing systems can be constructed without the use of mass analyzing magnets. The same source has also been used to produce steady-state beams of metallic ions.

引用

页码：291 / 294

页数：4

共 4 条

[1]

GAMMEL G, 1991, 1991 P PART ACC C SA, P2023

[2] APPLICATIONS OF SIMOX TECHNOLOGY TO CMOS LSI AND RADIATION-HARDENED DEVICES [J].