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X-RAY-INDUCED REACTIONS AND RESIST FEATURES OF POLYDIBUTYLGERMANE
被引:6
作者
:
BAN, H
论文数:
0
引用数:
0
h-index:
0
BAN, H
DEGUCHI, K
论文数:
0
引用数:
0
h-index:
0
DEGUCHI, K
TANAKA, A
论文数:
0
引用数:
0
h-index:
0
TANAKA, A
机构
:
来源
:
JOURNAL OF APPLIED POLYMER SCIENCE
|
1989年
/ 37卷
/ 06期
关键词
:
D O I
:
10.1002/app.1989.070370613
中图分类号
:
O63 [高分子化学(高聚物)];
学科分类号
:
070305 ;
080501 ;
081704 ;
摘要
:
引用
收藏
页码:1589 / 1593
页数:5
相关论文
共 10 条
[1]
ON THE THERMAL INTERCONVERSION OF MATRIX-ISOLATED DIMETHYLSILYLENE AND 2SILAPROPENE - THEIR REACTIONS WITH OXYGEN ATOM DONORS
ARRINGTON, CA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
ARRINGTON, CA
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
WEST, R
MICHL, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
MICHL, J
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1983,
105
(19)
: 6176
-
6177
[2]
THE IMPORTANCE OF ORGANOSILANE POLYMER PHOTOOXIDATION IN RESIST PATTERN FABRICATION
BAN, H
论文数:
0
引用数:
0
h-index:
0
BAN, H
SUKEGAWA, K
论文数:
0
引用数:
0
h-index:
0
SUKEGAWA, K
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1987,
33
(08)
: 2787
-
2793
[3]
STEP-AND-REPEAT X-RAY PHOTO HYBRID LITHOGRAPHY FOR 0.3-MU-M MOS DEVICES
DEGUCHI, K
论文数:
0
引用数:
0
h-index:
0
DEGUCHI, K
KOMATSU, K
论文数:
0
引用数:
0
h-index:
0
KOMATSU, K
NAMATSU, H
论文数:
0
引用数:
0
h-index:
0
NAMATSU, H
SEKIMOTO, M
论文数:
0
引用数:
0
h-index:
0
SEKIMOTO, M
MIYAKE, M
论文数:
0
引用数:
0
h-index:
0
MIYAKE, M
HIRATA, K
论文数:
0
引用数:
0
h-index:
0
HIRATA, K
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1987,
34
(04)
: 759
-
764
[4]
HAYASAKA T, 1986, J VAC SCI TECHNOL B, V3, P1581
[5]
SOLUBLE POLYSILANES - AN INTERESTING NEW CLASS OF RADIATION SENSITIVE MATERIALS
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
MILLER, RD
HOFER, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
HOFER, D
FICKES, GN
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
FICKES, GN
WILLSON, CG
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
WILLSON, CG
MARINERO, E
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
MARINERO, E
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
WEST, R
[J].
POLYMER ENGINEERING AND SCIENCE,
1986,
26
(16)
: 1129
-
1134
[6]
ORGANOGERMANE HOMOPOLYMERS AND COPOLYMERS WITH ORGANOSILANES
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
WEST, R
[J].
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY,
1985,
23
(08)
: 2099
-
2107
[7]
ORGANOSILANE HIGH POLYMERS - ELECTRONIC-SPECTRA AND PHOTODEGRADATION
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
WEST, R
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
MILLER, RD
HOFER, D
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
HOFER, D
[J].
JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS,
1983,
21
(10)
: 823
-
829
[8]
POLYSILANE HIGH POLYMERS - MECHANISM OF PHOTODEGRADATION
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
WEST, R
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
MILLER, RD
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1985,
107
(09)
: 2737
-
2742
[9]
THE POLYSILANE HIGH POLYMERS
WEST, R
论文数:
0
引用数:
0
h-index:
0
WEST, R
[J].
JOURNAL OF ORGANOMETALLIC CHEMISTRY,
1986,
300
(1-2)
: 327
-
346
[10]
ZEIGLER JM, 1985, P SOC PHOTO-OPT INST, V539, P166, DOI 10.1117/12.947830
←
1
→
共 10 条
[1]
ON THE THERMAL INTERCONVERSION OF MATRIX-ISOLATED DIMETHYLSILYLENE AND 2SILAPROPENE - THEIR REACTIONS WITH OXYGEN ATOM DONORS
ARRINGTON, CA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
ARRINGTON, CA
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
WEST, R
MICHL, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV UTAH,DEPT CHEM,SALT LAKE CITY,UT 84112
MICHL, J
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1983,
105
(19)
: 6176
-
6177
[2]
THE IMPORTANCE OF ORGANOSILANE POLYMER PHOTOOXIDATION IN RESIST PATTERN FABRICATION
BAN, H
论文数:
0
引用数:
0
h-index:
0
BAN, H
SUKEGAWA, K
论文数:
0
引用数:
0
h-index:
0
SUKEGAWA, K
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1987,
33
(08)
: 2787
-
2793
[3]
STEP-AND-REPEAT X-RAY PHOTO HYBRID LITHOGRAPHY FOR 0.3-MU-M MOS DEVICES
DEGUCHI, K
论文数:
0
引用数:
0
h-index:
0
DEGUCHI, K
KOMATSU, K
论文数:
0
引用数:
0
h-index:
0
KOMATSU, K
NAMATSU, H
论文数:
0
引用数:
0
h-index:
0
NAMATSU, H
SEKIMOTO, M
论文数:
0
引用数:
0
h-index:
0
SEKIMOTO, M
MIYAKE, M
论文数:
0
引用数:
0
h-index:
0
MIYAKE, M
HIRATA, K
论文数:
0
引用数:
0
h-index:
0
HIRATA, K
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1987,
34
(04)
: 759
-
764
[4]
HAYASAKA T, 1986, J VAC SCI TECHNOL B, V3, P1581
[5]
SOLUBLE POLYSILANES - AN INTERESTING NEW CLASS OF RADIATION SENSITIVE MATERIALS
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
MILLER, RD
HOFER, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
HOFER, D
FICKES, GN
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
FICKES, GN
WILLSON, CG
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
WILLSON, CG
MARINERO, E
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
MARINERO, E
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV WISCONSIN,MADISON,WI 53706
UNIV WISCONSIN,MADISON,WI 53706
WEST, R
[J].
POLYMER ENGINEERING AND SCIENCE,
1986,
26
(16)
: 1129
-
1134
[6]
ORGANOGERMANE HOMOPOLYMERS AND COPOLYMERS WITH ORGANOSILANES
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
WEST, R
[J].
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY,
1985,
23
(08)
: 2099
-
2107
[7]
ORGANOSILANE HIGH POLYMERS - ELECTRONIC-SPECTRA AND PHOTODEGRADATION
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
WEST, R
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
MILLER, RD
HOFER, D
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
HOFER, D
[J].
JOURNAL OF POLYMER SCIENCE PART C-POLYMER LETTERS,
1983,
21
(10)
: 823
-
829
[8]
POLYSILANE HIGH POLYMERS - MECHANISM OF PHOTODEGRADATION
TREFONAS, P
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
TREFONAS, P
WEST, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
WEST, R
MILLER, RD
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
MILLER, RD
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1985,
107
(09)
: 2737
-
2742
[9]
THE POLYSILANE HIGH POLYMERS
WEST, R
论文数:
0
引用数:
0
h-index:
0
WEST, R
[J].
JOURNAL OF ORGANOMETALLIC CHEMISTRY,
1986,
300
(1-2)
: 327
-
346
[10]
ZEIGLER JM, 1985, P SOC PHOTO-OPT INST, V539, P166, DOI 10.1117/12.947830
←
1
→