STEP-AND-REPEAT X-RAY PHOTO HYBRID LITHOGRAPHY FOR 0.3-MU-M MOS DEVICES

被引：4

作者：

DEGUCHI, K

KOMATSU, K

NAMATSU, H

SEKIMOTO, M

MIYAKE, M

HIRATA, K

机构：

来源：

关键词：

D O I：

10.1109/T-ED.1987.22993

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：759 / 764

页数：6

共 12 条

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