EVALUATION OF PURE NOVOLAK CRESOL-FORMALDEHYDE RESINS FOR DEEP UV LITHOGRAPHY

被引：18

作者：

GIPSTEIN, E

OUANO, AC

TOMPKINS, T

机构：

来源：

关键词：

D O I：

10.1149/1.2123757

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：201 / 205

页数：5

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