STRUCTURAL AND ELECTRICAL-PROPERTIES OF SILICON-NITRIDE FILMS PREPARED BY MULTIPOLAR PLASMA-ENHANCED DEPOSITION

被引：20

作者：

BOHER, P

RENAUD, M

VANLJZENDOORN, LJ

BARRIER, J

HILY, Y

机构：

来源：

关键词：

D O I：

10.1063/1.339927

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1464 / 1472

页数：9

共 22 条

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