MECHANISMS OF PLASMA-ENHANCED SILICON-NITRIDE DEPOSITION USING SIH4-N2 MIXTURE

被引：144

作者：

DUN, H

PAN, P

WHITE, FR

DOUSE, RW

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 07期

关键词：

D O I：

10.1149/1.2127682

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1555 / 1563

页数：9

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