MOLECULAR-BEAM EPITAXY OF ZNS ON (001)GAAS USING ELEMENTAL SOURCES

被引:4
作者
LANG, M
SCHIKORA, D
GIFTGE, C
WIDMER, T
FORSTNER, A
BRUNTHALER, G
VONORTENBERG, M
LISCHKA, K
机构
[1] UNIV LINZ,INST HALBLEITERPHYS,A-4040 LINZ,AUSTRIA
[2] TECH UNIV CAROLO WILHELMINA BRAUNSCHWEIG,INST HALBLEITERPHYS,D-38106 BRAUNSCHWEIG,GERMANY
关键词
D O I
10.1088/0268-1242/9/12/011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
ZnS epilayers have been grown by molecular beam epitaxy on (001) GaAs from elemental zinc and sulphur sources. Reflection high-energy electron diffraction (RHEED) measurements were performed to study the surface reconstruction of (001) ZnS and to establish a surface reconstruction diagram in order to find the optimum growth conditions. The dependence of the growth rate of ZnS on the substrate temperature and on the beam pressure ratio p(s)/p(Zn) has been measured. The strain relaxation of the ZnS epilayers was determined by high-resolution RHEED measurements. The tow-temperature photoluminescence spectra of the ZnS epilayers show sharp ultraviolet exciton lines and a blue deep-centre emission.
引用
收藏
页码:2229 / 2232
页数:4
相关论文
共 18 条
[1]  
COHENSOLAL G, 1994, J CRYST GROWTH, V68, P68
[2]   MOLECULAR-BEAM EPITAXY OF ZNS USING AN ELEMENTAL S SOURCE [J].
COOK, JW ;
EASON, DB ;
VAUDO, RP ;
SCHETZINA, JF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (02) :901-904
[3]   GEOMETRICAL-THEORY OF CRITICAL THICKNESS AND RELAXATION INSTRAINED-LAYER GROWTH [J].
DUNSTAN, DJ ;
YOUNG, S ;
DIXON, RH .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (06) :3038-3045
[4]   SELF-LIMITING MONOLAYER EPITAXY (SME) - A NEW APPROACH TO THE GROWTH OF WIDE GAP II-VI HETEROSTRUCTURES [J].
FASCHINGER, W ;
JUZA, P ;
FERREIRA, S ;
ZAJICEK, H ;
PESEK, A ;
SITTER, H ;
LISCHKA, K .
JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) :622-626
[5]   PHOTO-ASSISTED HOMOEPITAXIAL GROWTH OF ZNS BY MOLECULAR-BEAM EPITAXY [J].
KITAGAWA, M ;
TOMOMURA, Y ;
NAKANISHI, K ;
SUZUKI, A ;
NAKAJIMA, S .
JOURNAL OF CRYSTAL GROWTH, 1990, 101 (1-4) :52-55
[6]  
LANG M, 1994, J CRYST GROWTH, V68, P81
[7]   EFFECTS OF [H2S]/[DMZN] MOLAR RATIO ON ZNS FILMS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
LI, JW ;
SU, YK ;
YOKOYAMA, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (02) :907-910
[8]   PHOTOLUMINESCENCE STUDY OF MBE-GROWN FILMS OF ZNS [J].
MCCLEAN, IP ;
THOMAS, CB .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1992, 7 (11) :1394-1399
[9]   RHEED OBSERVATION ON (001)ZNSE SURFACE - MBE SURFACE PHASE-DIAGRAM AND KINETIC-BEHAVIOR OF ZN AND SE ADATOMS [J].
MENDA, K ;
TAKAYASU, I ;
MINATO, T ;
KAWASHIMA, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (08) :L1326-L1329
[10]   ON THE PRACTICAL APPLICATIONS OF MBE SURFACE PHASE-DIAGRAMS [J].
NEWSTEAD, SM ;
KUBIAK, RAA ;
PARKER, EHC .
JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) :49-54