MOLECULAR-BEAM EPITAXY OF ZNS ON (001)GAAS USING ELEMENTAL SOURCES

被引:4
作者
LANG, M
SCHIKORA, D
GIFTGE, C
WIDMER, T
FORSTNER, A
BRUNTHALER, G
VONORTENBERG, M
LISCHKA, K
机构
[1] UNIV LINZ,INST HALBLEITERPHYS,A-4040 LINZ,AUSTRIA
[2] TECH UNIV CAROLO WILHELMINA BRAUNSCHWEIG,INST HALBLEITERPHYS,D-38106 BRAUNSCHWEIG,GERMANY
关键词
D O I
10.1088/0268-1242/9/12/011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
ZnS epilayers have been grown by molecular beam epitaxy on (001) GaAs from elemental zinc and sulphur sources. Reflection high-energy electron diffraction (RHEED) measurements were performed to study the surface reconstruction of (001) ZnS and to establish a surface reconstruction diagram in order to find the optimum growth conditions. The dependence of the growth rate of ZnS on the substrate temperature and on the beam pressure ratio p(s)/p(Zn) has been measured. The strain relaxation of the ZnS epilayers was determined by high-resolution RHEED measurements. The tow-temperature photoluminescence spectra of the ZnS epilayers show sharp ultraviolet exciton lines and a blue deep-centre emission.
引用
收藏
页码:2229 / 2232
页数:4
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