ZNS-MN ELECTROLUMINESCENT FILMS PREPARED BY HOT WALL TECHNIQUE

被引:13
作者
TAKEUCHI, Y [1 ]
OKUNO, Y [1 ]
NAKAMURA, T [1 ]
ISHINO, K [1 ]
ISHIDA, A [1 ]
FUJIYASU, H [1 ]
机构
[1] SHIZUOKA UNIV,FAC ENGN,DEPT APPL CHEM & MAT TECHNOL,HAMAMATSU,SHIZUOKA 432,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 5A期
关键词
ZNS-MN; ELECTROLUMINESCENCE; HOT WALL TECHNIQUE; PLANAR DOPING; X-RAY DIFFRACTION; SIMS; ESR;
D O I
10.1143/JJAP.31.1391
中图分类号
O59 [应用物理学];
学科分类号
摘要
Manganese-doped zinc sulfide electroluminescent (EL) films were prepared for the first time by a hot wall technique with Mn planar doping. Undoped and Mn-doped ZnS films on glass substrates exhibit preferred cubic (111) orientation at the substrate temperature of 280-degrees-C. The DELTA-2-theta value (full width at half-maximum) of the 111 reflection of the ZnS:Mn film in an X-ray diffraction pattern was found to be improved with an increase in Mn concentration and film thickness. By means of secondary ion mass spectroscopy (SIMS) and electron spin resonance (ESR) analyses, it was confirmed that this doping technique was very efficient in obtaining a homogeneous Mn2+ distribution which yielded highly luminescent EL devices. For an optimum device with double insulators of stacked Ta2O5/Al2O3 layers, the maximum luminance and efficiency at 1 kHz sinusoidal excitation were 3200 cd/m2 and 1.3 lm/W, respectively.
引用
收藏
页码:1391 / 1395
页数:5
相关论文
共 12 条
[1]   PROPERTIES OF CDS-ZNS SUPERLATTICES PREPARED BY HOT WALL EPITAXY [J].
FUJIYASU, H ;
SASAYA, T ;
KATAYAMA, M ;
ISHINO, K ;
ISHIDA, A ;
KUWABARA, H ;
NAKANISHI, Y ;
SHIMAOKA, G .
APPLIED SURFACE SCIENCE, 1988, 33-4 :854-861
[2]  
FUJIYASU H, IN PRESS J CRYST GRO
[3]  
FUJIYASU H, 1989, 4TH P INT WORKSH TOT, P116
[4]   PHOTO-ASSISTED METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION PREPARATION OF POLYCRYSTALLINE ZNS-MN FILMS FOR THIN-FILM ELECTROLUMINESCENT DEVICES [J].
HIRABAYASHI, K ;
KOZAWAGUCHI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1989, 28 (05) :814-818
[5]   PHYSICAL AND ELECTRICAL CHARACTERIZATION OF CO-DEPOSITED ZNS-MN ELECTROLUMINESCENT THIN-FILM STRUCTURES [J].
HURD, JM ;
KING, CN .
JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (06) :879-891
[6]  
INOGUCHI T, 1977, TOP APPL PHYS, V17, P222
[7]  
MITA J, 1979, JPN J APPL PHYS, V26, pL541
[8]   LOW-VOLTAGE-DRIVEN AC THIN-FILM ELECTROLUMINESCENT CELL CONTAINING A ZNS-MN FILM DEPOSITED BY MOLECULAR-BEAM EPITAXY [J].
OHTA, SI ;
TADOKORO, T ;
SATOU, S ;
YOKOYAMA, M .
THIN SOLID FILMS, 1988, 162 (1-2) :73-80
[9]   LOW-THRESHOLD-VOLTAGE AC THIN-FILM ELECTROLUMINESCENT DEVICE [J].
OKAMOTO, K ;
NASU, Y ;
OKUYAMA, M ;
HAMAKAWA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) :215-220
[10]   TRANSFERRED CHARGE IN THE ACTIVE LAYER AND EL DEVICE CHARACTERISTICS OF TFEL CELLS [J].
ONO, YA ;
KAWAKAMI, H ;
FUYAMA, M ;
ONISAWA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (09) :1482-1492