THE EFFECTS OF BIASING AND ANNEALING ON THE OPTICAL-PROPERTIES OF RADIOFREQUENCY SPUTTERED VO2

被引：22

作者：

RAZAVI, A

BOBYAK, L

FALLON, P

机构：

[1] School of Engineering and Physical Sciences, Materials Processing Center, Wilkes College, Wilkes-Barre, Pennsylvania

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期

关键词：

D O I：

10.1116/1.576887

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Vanadium dioxide thin films were deposited by radio-frequency (rf) reactive sputtering. An in situ anneal was found to improve stoichiometry, alter optical contrast, and increase grain size for a set of films. Biasing of a second set of substrates during deposition was found to increase the infrared (IR) transmission of films in the metallic state and degrade hysteresis characteristics. © 1990, American Vacuum Society. All rights reserved.

引用

页码：1391 / 1394

页数：4

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