RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE

被引：10

作者：

BAKER, PN

机构：

来源：

THIN SOLID FILMS | 1970年 / 6卷 / 05期

关键词：

D O I：

10.1016/0040-6090(70)90090-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：R57 / &

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[1] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
CALBICK, CJ
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) : 402 - &
[2] FORMATION OF FCC BCC AND BETA-TANTALUM FILMS BY EVAPORATION
MARCUS, RB
QUIGLEY, S
[J]. THIN SOLID FILMS, 1968, 2 (5-6) : 467 - &
[3] PHASE FORMING PROCESSES IN TANTALUM FILMS THROUGH SPUTTERING
NAKAMURA, M
FUJIMORI, M
NISHIMURA, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (05) : 557 - +
[4] EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS
SOSNIAK, J
POLITO, WJ
ROZGONYI, GA
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) : 3041 - &
[5] PHASE COMPOSITION AND CONDUCTIVITY OF SPUTTERED TANTALUM
WESTWOOD, WD
LIVERMORE, FC
[J]. THIN SOLID FILMS, 1970, 5 (5-6) : 407 - +