IN-DEPTH PROFILES OF OXIDE-FILMS ON GAAS STUDIED BY XPS

被引：36

作者：

MIZOKAWA, Y ^{[1
]}

IWASAKI, H ^{[1
]}

NISHITANI, R ^{[1
]}

NAKAMURA, S ^{[1
]}

机构：

[1] OSAKA UNIV,INST SCI & IND RES,SUITA,OSAKA 565,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷

关键词：

D O I：

10.7567/JJAPS.17S1.327

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：327 / 333

页数：7

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