NEW TECHNIQUE FOR EVALUATION OF SURFACES AND INTERFACES AT ATMOSPHERIC-PRESSURE BY USING REFRACTED X-RAY-FLUORESCENCE (RXF)

被引：6

作者：

SASAKI, YC

HIROKAWA, K

机构：

来源：

APPLIED SURFACE SCIENCE | 1991年 / 47卷 / 04期

关键词：

D O I：

10.1016/0169-4332(91)90090-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Refracted X-ray fluorescence (RXF) can evaluate thin films at atmospheric pressure. In this letter, we show the possibility of in-situ evaluation of surfaces and interfaces in atmospheric-pressure metal-organic chemical vapor deposition (AP-MOCVD) and atmospheric-pressure metal-organic vapor phase epitaxy (AP-MOVPE) by using the refracted X-ray fluorescence (RXF) technique. Evaluation at atmospheric pressure is illustrated by an example of evaporated metal thin films.

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页码：371 / 374

页数：4

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