SPIN-COATED AMORPHOUS-CHALCOGENIDE FILMS

[1] AN INORGANIC RESIST FOR ION-BEAM MICROFABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (01): : 18 - 22

[2] PHOTODECOMPOSITION OF AMORPHOUS AS2SE3 AND AS2S3 [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 4908 - &

[3] OPTICALLY FORMED DIELECTRIC GRATINGS IN THICK FILMS OF ARSENIC-SULFUR GLASS [J]. APPLIED OPTICS, 1970, 9 (07): : 1712 - &

[4] DRY-ETCHED INORGANIC RESIST [J]. APPLIED PHYSICS LETTERS, 1978, 33 (10) : 892 - 895

[5] INORGANIC RESIST FOR DRY PROCESSING AND DOPANT APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1973 - 1976

[6] DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS [J]. OPTICS COMMUNICATIONS, 1978, 24 (02) : 220 - 224

[7] CHANG MS, 1980, 9TH INT C P EL ION B

[8] CHEN JT, 1981, THESIS U PENNSYLVANI

[9] CHERN G, UNPUB

[10] DENEUFVILLE JP, 1974, J NON-CRYST SOLIDS, V13, P191, DOI 10.1016/0022-3093(74)90091-X

[1] AN INORGANIC RESIST FOR ION-BEAM MICROFABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (01): : 18 - 22

[2] PHOTODECOMPOSITION OF AMORPHOUS AS2SE3 AND AS2S3 [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 4908 - &

[3] OPTICALLY FORMED DIELECTRIC GRATINGS IN THICK FILMS OF ARSENIC-SULFUR GLASS [J]. APPLIED OPTICS, 1970, 9 (07): : 1712 - &

[4] DRY-ETCHED INORGANIC RESIST [J]. APPLIED PHYSICS LETTERS, 1978, 33 (10) : 892 - 895

[5] INORGANIC RESIST FOR DRY PROCESSING AND DOPANT APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1973 - 1976

[6] DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS [J]. OPTICS COMMUNICATIONS, 1978, 24 (02) : 220 - 224

[7] CHANG MS, 1980, 9TH INT C P EL ION B

[8] CHEN JT, 1981, THESIS U PENNSYLVANI

[9] CHERN G, UNPUB

[10] DENEUFVILLE JP, 1974, J NON-CRYST SOLIDS, V13, P191, DOI 10.1016/0022-3093(74)90091-X