INFRARED STUDY OF ALN FILMS PREPARED BY ION-BEAM DEPOSITION .1. EFFECTS OF FILM THICKNESS, AGING, AND MOISTURE

被引:35
作者
MAZUR, U [1 ]
机构
[1] WASHINGTON STATE UNIV,CHEM PHYS PROGRAM,PULLMAN,WA 99164
关键词
D O I
10.1021/la00098a001
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Specular reflectance FT-IR spectroscopy was employed to study the changes in the chemical composition of ion beam deposited AIN thin films as a function of film thickness, aging under air and vacuum, and exposure to liquid water. Aluminum nitride films 10, 20, and 40 nm thick were prepared by utilizing a pure aluminum metal target and both pure and 25‥ hydrogen enriched nitrogen. All films were deposited on gold substrates. It was found that the concentration of the AI-N2 species present in the AIN films strongly depends on the film thickness and on the gas mixture used for film fabrication. We also observed that the AIN films fabricated with pure N2 plasma are less prone to hydrolysis (when exposed to room air) than are the films prepared with H2-N2 plasma. Prolonged vacuum environment had no significant effect on the spectra of the differently prepared AIN films. Exposure to liquid water promoted hydrolysis equally well in N2 and H2-N2 fabricated AIN films. © 1990, American Chemical Society. All rights reserved.
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页码:1331 / 1337
页数:7
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