JOSEPHSON TUNNEL-JUNCTION ELECTRODE MATERIALS

被引:11
作者
KIRCHER, CJ [1 ]
MURAKAMI, M [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,RES STAFF,YORKTOWN HTS,NY 10598
关键词
D O I
10.1126/science.208.4446.944
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
引用
收藏
页码:944 / 950
页数:7
相关论文
共 27 条
[1]   COMPUTING AT 4-DEGREES-K [J].
ANACKER, W .
IEEE SPECTRUM, 1979, 16 (05) :26-37
[2]   INVESTIGATION OF THERMAL CYCLING OF PB-ALLOY JOSEPHSON TUNNELING GATES [J].
BASAVAIAH, S ;
GREINER, JH .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (11) :4630-4633
[3]  
BASAVAIAH S, 1978, J PHYS PARIS SC6, V39, P1247
[4]  
BASAVAISH S, UNPUBLISHED
[5]   FABRICATION AND PROPERTIES OF NIOBIUM JOSEPHSON TUNNEL-JUNCTIONS [J].
BROOM, RF ;
LAIBOWITZ, RB ;
MOHR, TO ;
WALTER, W .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :212-222
[6]   OVERVIEW OF JOSEPHSON PACKAGING [J].
BROWN, AV .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :167-171
[7]  
Fromhold A.T., 1976, THEORY METAL OXIDATI
[8]  
GHEEWALA T, UNPUBLISHED
[9]   30-PS JOSEPHSON CURRENT INJECTION LOGIC (CIL) [J].
GHEEWALA, TR .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (05) :787-793
[10]   FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].
GREINER, JH ;
KIRCHER, CJ ;
KLEPNER, SP ;
LAHIRI, SK ;
WARNECKE, AJ ;
BASAVAIAH, S ;
YEN, ET ;
BAKER, JM ;
BROSIOUS, PR ;
HUANG, HCW ;
MURAKAMI, M ;
AMES, I .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205