STRUCTURAL DETERMINATION OF SI(100)2X2-AL BY TENSOR LEED

被引：37

作者：

SAKAMA, H

MURAKAMI, K

NISHIKATA, K

KAWAZU, A

机构：

[1] Department of Applied Physics, University of Tokyo, Bunkyo-ku, Tokyo 113

来源：

PHYSICAL REVIEW B | 1993年 / 48卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.48.5278

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The structure of a Si(100)2 X 2-Al surface at 0.5 monolayers is determined by tensor low-energy electron diffraction. The parallel dimer model is more favorable than the orthogonal dimer model. The R factor for the optimized parallel dimer structure is 0.15. The bond length of the Al dimer is almost equal to the value expected from the Pauling covalent radii. All bond lengths in five surface layers including Si-Al and Si dimer bonds are within the range of 5% from the bulk value. The distortion extends at least through the first five layers into the bulk.

引用

页码：5278 / 5281

页数：4

共 17 条

[11] RELIABILITY FACTORS FOR LEED CALCULATIONS [J].