CHANGE OF SURFACE COMPOSITION OF SIO2 LAYERS DURING SPUTTERING

被引：26

作者：

TUROS, A ^{[1
]}

VANDERWE.WF ^{[1
]}

SIGURD, D ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91109

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 06期

关键词：

D O I：

10.1063/1.1663667

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2777 / 2779

页数：3

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