THERMAL-STABILITY OF THIN PTSI FILMS ON SILICON SUBSTRATES

被引：74

作者：

SINHA, AK

SHENG, TT

MARCUS, RB

HASZKO, SE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 09期

关键词：

D O I：

10.1063/1.1661781

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3637 / +

页数：1

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