HYDROGENATION OF REACTIVELY SPUTTERED AINXOY FILMS

[1] DETERMINATION OF REFRACTIVE INDEX OF THIN DIELECTRIC FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1964, 54 (02) : 198 - &

[2] ELECTRONIC-STRUCTURE OF HYDROGENATED AND UNHYDROGENATED AMORPHOUS SINX (0-LESS-THAN-X-LESS-THAN-1.6) - A PHOTOEMISSION-STUDY [J]. PHYSICAL REVIEW B, 1984, 30 (04): : 1896 - 1910

[3] DETERMINATION OF THE COMPOSITION OF SPUTTERED SILICON OXYNITRIDE FILMS BY AUGER-ELECTRON SPECTROSCOPY AND RUTHERFORD BACKSCATTERING SPECTROMETRY [J]. THIN SOLID FILMS, 1988, 167 (1-2) : L1 - L5

[4] SAEGER CH, 1984, APPL PHYS LETT, V45, P1060

[5] THE ROLE OF HYDROGEN IN SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS [J]. THIN SOLID FILMS, 1985, 124 (3-4) : 301 - 308

[6] EFFECT OF HYDROGEN GAS ON C-AXIS ORIENTED ALN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) : L169 - L172

[7] TAUC J, 1971, OPTICAL PROPERTIES S, P277

[1] DETERMINATION OF REFRACTIVE INDEX OF THIN DIELECTRIC FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1964, 54 (02) : 198 - &

[2] ELECTRONIC-STRUCTURE OF HYDROGENATED AND UNHYDROGENATED AMORPHOUS SINX (0-LESS-THAN-X-LESS-THAN-1.6) - A PHOTOEMISSION-STUDY [J]. PHYSICAL REVIEW B, 1984, 30 (04): : 1896 - 1910

[3] DETERMINATION OF THE COMPOSITION OF SPUTTERED SILICON OXYNITRIDE FILMS BY AUGER-ELECTRON SPECTROSCOPY AND RUTHERFORD BACKSCATTERING SPECTROMETRY [J]. THIN SOLID FILMS, 1988, 167 (1-2) : L1 - L5

[4] SAEGER CH, 1984, APPL PHYS LETT, V45, P1060

[5] THE ROLE OF HYDROGEN IN SILICON-NITRIDE AND SILICON OXYNITRIDE FILMS [J]. THIN SOLID FILMS, 1985, 124 (3-4) : 301 - 308

[6] EFFECT OF HYDROGEN GAS ON C-AXIS ORIENTED ALN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (03) : L169 - L172

[7] TAUC J, 1971, OPTICAL PROPERTIES S, P277