EFFECT OF HYDROGEN GAS ON C-AXIS ORIENTED ALN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

被引:38
作者
TAKEDA, F [1 ]
MORI, T [1 ]
TAKAHASHI, T [1 ]
机构
[1] TOYAMA UNIV,FAC TECHNOL,TAKAOKA 933,JAPAN
关键词
D O I
10.1143/JJAP.20.L169
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L169 / L172
页数:4
相关论文
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