PHOTOPROCESSES IN ORGANOMETALLICS

被引:9
作者
LARCIPRETE, R
机构
[1] ENEA, Dipartimento Sviluppo Tecnologie di Punta, 00044 Frascati, RM
关键词
D O I
10.1016/0169-4332(90)90114-F
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Recently, among other organometallics, metal alkyls have gained relevant importance as precursor compounds in the area of laser-CVD of metal film and microstructures. A great deal of attention has been devoted to the study of their visible/UV laser photochemistry with the aim to achieve the essential understanding needed to control the photoreaction. Several spectroscopic techniques have been used to monitor the photolysis of a variety of volatile metal alkyls and to characterize the energy distribution of the nascent fragments. In many cases a detailed understanding of the process dynamics has been achieved. The influence of UV or visible radiation on molecule-substrate systems has been investigated by revealing the modifications induced in the adsorbate by surface analysis techniques in UHV environments. © 1990.
引用
收藏
页码:19 / 26
页数:8
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