SI-29 NMR-SPECTRA FOR REACTIVELY SPUTTERED AMORPHOUS-SILICON

被引：25

作者：

JEFFREY, FR

MURPHY, PD

GERSTEIN, BC

机构：

[1] IOWA STATE UNIV SCI & TECHNOL,DEPT PHYS,AMES,IA 50011

[2] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,AMES,IA 50011

[3] IOWA STATE UNIV SCI & TECHNOL,AMES LAB,DEPT CHEM,AMES,IA 50011

来源：

PHYSICAL REVIEW B | 1981年 / 23卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.23.2099

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：2099 / 2101

页数：3

相关论文

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