FABRICATION OF THIN DIELECTRIC FILMS WITH LOW INTERNAL STRESSES

被引：7

作者：

SCHEUERMAN, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1970年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.1315777

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：143 / +

页数：1

共 11 条

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[2]

CAMPBELL DS, 1969, HANDBOOK THIN FILM T

[3]

CAMPBELL DS, 1960, 7 T NAT VAC S, P313

[4] STRESSES DEVELOPED IN OPTICAL FILM COATINGS [J].

ENNOS, AE .

APPLIED OPTICS, 1966, 5 (01) :51-&

[5]

FUJIWARA S, 1963, J OPT SOC AM, V53, P1317

FUJIWARA, S .

[7]

Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[8]

JACOBSSON R, 1965, JPN J APPL PHYS, VS 4, P333

[9] STRESSES IN EVAPORATED SILICON MONOXIDE FILMS [J].

NOVICE, MA .

[10] DEFORMATION OF OPTICAL SURFACES BY FILM STRESS [J].

SCHEUERMAN, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :145-+