GROWTH OF SI ON SI(100) VIA H/CL EXCHANGE AND THE EFFECT OF INTERFACIAL BORON

被引:43
作者
KOLESKE, DD
GATES, SM
BEACH, DB
机构
[1] IBM T. J. Watson Research Center, Yorktown Heights
关键词
D O I
10.1063/1.352261
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using alternating exposures of Si2H6 and Si2Cl6, very thin Si layers have been grown on the Si(100) surface at temperatures (T) as low as 475-degrees-C. Although this growth method is not truly self-limiting, some of the desired features for Si atomic layer epitaxy (ALE) are retained, as discussed here. The growth rate of new Si on Si(100) using this method is limited by the thermal desorption of H-2 and HCl. Doping the surface with boron atoms can lower the growth temperature, due to a weakening of the Si-H and Si-Cl bonds on the surface as observed in the temperature programmed desorption results from H-2, HCl, and SiCl2 desorption from the clean and the boron-doped Si(100) surfaces.
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页码:4073 / 4082
页数:10
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