COMMENT ON THE COMPOSITIONAL DEPENDENCE OF BANDGAP IN ALGAAS AND BAND-EDGE DISCONTINUITIES IN ALGAAS-GAAS HETEROSTRUCTURES

被引:10
作者
GIUGNI, S [1 ]
TANSLEY, TL [1 ]
机构
[1] MACQUARIE UNIV,SEMICOND SCI & TECHNOL LABS,N RYDE,NSW 2113,AUSTRALIA
关键词
D O I
10.1088/0268-1242/7/8/015
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A range of values exists in the literature for compositional dependence of bandgap in AlxGa1-xAs below the direct-indirect alloy composition and the way this is apportioned between the conduction and valence band edges. We compare results obtained from studies of compositionally graded quantum-well structures with consensus values and find that a self-consistent picture emerges only if a larger bandgap dependence than is still widely quoted in the literature is used. The preferred relation for bandgap dependence is DELTA-E(g)(x) = 1.427x + 0.041x2 (eV) with a conduction-to-valence band split ratio of about 60 : 40, yielding DELTA-E(c) = 0.88x and DELTA-E(v) = 0.55x.
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页码:1113 / 1116
页数:4
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