DEPENDENCE OF SEGREGATED MICROSTRUCTURE IN SPUTTER-DEPOSITED COCR FILM ON DEPOSITION CONDITIONS

被引：18

作者：

MASUYA, H ^{[1
]}

AWANO, H ^{[1
]}

机构：

[1] SONY CORP,INFORMAT SYST RES CTR,YOKOHAMA,KANAGAWA 240,JAPAN

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1987年 / 23卷 / 05期

关键词：

D O I：

10.1109/TMAG.1987.1065612

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2064 / 2066

页数：3

共 6 条

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[6] TEM OBSERVATION OF SEGREGATED MICROSTRUCTURE IN SPUTTERED CO-CR FILM [J].

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