REACTIVE SPUTTER ETCHING OF MAGNETIC-MATERIALS IN AN HCL PLASMA

[1] ANDERSEN HH, 1981, SPUTTERING PARTICLE, V1

[2] BRIL T, 1984, Patent No. 4439294

[3] DEVELOPMENT OF A GENERAL SURFACE CONTOUR BY ION EROSION - THEORY AND COMPUTER-SIMULATION [J]. JOURNAL OF MATERIALS SCIENCE, 1974, 9 (05) : 725 - 736

[4] GLOERSEN PG, 1976, SOLID STATE TECHNOL, V4, P68

[5] JOHNSON LF, 1984, ION BOMBARDMENT MODI

[6] MICROFABRICATION BY ION-BEAM ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 164 - 170

[7] REDEPOSITION - SERIOUS PROBLEM IN RF SPUTTER ETCHING OF STRUCTURES WITH MICRONMETER DIMENSIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 281 - 284

[8] SIDEWALL TAPERING IN REACTIVE ION ETCHING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (03) : 689 - 693

[9] NARROW TRACK MAGNETIC HEAD FABRICATED BY ION-ETCHING METHOD [J]. IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (03) : 1060 - 1064

[10] NEURENTHER AR, 1986, SOLID STATE TECHNOL, V3, P71

[1] ANDERSEN HH, 1981, SPUTTERING PARTICLE, V1

[2] BRIL T, 1984, Patent No. 4439294

[3] DEVELOPMENT OF A GENERAL SURFACE CONTOUR BY ION EROSION - THEORY AND COMPUTER-SIMULATION [J]. JOURNAL OF MATERIALS SCIENCE, 1974, 9 (05) : 725 - 736

[4] GLOERSEN PG, 1976, SOLID STATE TECHNOL, V4, P68

[5] JOHNSON LF, 1984, ION BOMBARDMENT MODI

[6] MICROFABRICATION BY ION-BEAM ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 164 - 170

[7] REDEPOSITION - SERIOUS PROBLEM IN RF SPUTTER ETCHING OF STRUCTURES WITH MICRONMETER DIMENSIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 281 - 284

[8] SIDEWALL TAPERING IN REACTIVE ION ETCHING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (03) : 689 - 693

[9] NARROW TRACK MAGNETIC HEAD FABRICATED BY ION-ETCHING METHOD [J]. IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (03) : 1060 - 1064

[10] NEURENTHER AR, 1986, SOLID STATE TECHNOL, V3, P71