ELECTRON-EMISSION FROM PHOSPHORUS-DOPED AND BORON-DOPED POLYCRYSTALLINE DIAMOND FILMS

被引:97
作者
OKANO, K
GLEASON, KK
机构
[1] Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge
关键词
DIAMOND; ELECTRON EMISSION; ELECTRON FIELD EMISSION;
D O I
10.1049/el:19950027
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron emission from CVD-grown phosphorus (P)- and boron (B)-doped polycrystalline diamond films has been studied. The current density against electric field characteristics of the P-doped film showed low-field emission compared to the B-doped film. From the slope ratio of the Fowler-Nordheim (F-N) characteristics of P- and B-doped films, a ratio of 0.66 for the emission barrier height was obtained. The small ratio might be caused by the n-type semiconducting properties of P-doped diamond films.
引用
收藏
页码:74 / 75
页数:2
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