OPTIMUM COMPOSITION IN MBE-ZNSXSE1-X GAAS FOR HIGH-QUALITY HETEROEPITAXIAL GROWTH

被引:2
作者
MATSUMURA, N
TSUBOKURA, M
MIYAGAWA, K
NAKAMURA, N
SARAIE, J
机构
[1] Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institute of Technology, Matsugasaki, Kyoto
关键词
D O I
10.1016/0022-0248(90)90561-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
An optimum composition x of MBE-ZnSxSe1-x/GaAs has been studied by surface morphology, X-ray diffraction and fluorescence microscopic study to obtain epilayers with the best quality. The epilayers with a lattice-matching composition at the growth temperature (xgt=0.083) had extremely smooth surfaces and the minimum FWHM of X-ray rocking curves in spite of thermal strain. Also, the orange emission due to Ga diffusion from the substrate was not observed at the epilayer-substrate interface in these epilayers. The epilayers with the best quality were grown with the composition of xgt. © 1990.
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页码:446 / 450
页数:5
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