THE FORMATION AND CONTROL OF DIRECT-CURRENT MAGNETRON DISCHARGES FOR THE HIGH-RATE REACTIVE PROCESSING OF THIN-FILMS

被引：84

作者：

HOWSON, RP

SPENCER, AG

OKA, K

LEWIN, RW

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576260

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1230 / 1234

页数：5

共 11 条

[1] GAUTHERIN G, 1907, 7TH P INT VAC C 3RD, P1579
[2] ION PLATING WITH AN ARC SOURCE
HATTO, PW
TEER, DG
[J]. VACUUM, 1986, 36 (1-3) : 67 - 69
[3] REACTIVE ION PLATING OF TIO2
HOWSON, RP
SUZUKI, K
BISHOP, CA
RIDGE, MI
[J]. VACUUM, 1984, 34 (1-2) : 291 - 294
[4] MATTOX DM, 1977, 1977 P INT C ION PLA, P10
[5] OKA K, IN PRESS P SPIE
[6] COMPOSITION CONTROL IN CONDUCTING OXIDE THIN-FILMS
RIDGE, MI
HOWSON, RP
[J]. THIN SOLID FILMS, 1982, 96 (02) : 121 - 127
[7] SCHILLER S, 1987, 1987 P INT C ION PLA
[8] SCHILLER S, 1981, THIN SOLID FILMS, V83, P253
[9] PRESSURE STABILITY IN REACTIVE MAGNETRON SPUTTERING
SPENCER, AG
HOWSON, RP
LEWIN, RW
[J]. THIN SOLID FILMS, 1988, 158 (01) : 141 - 149
[10] ACTIVATION OF REACTIVE SPUTTERING BY A PLASMA BEAM FROM AN UNBALANCED MAGNETRON
SPENCER, AG
OKA, K
HOWSON, RP
LEWIN, RW
[J]. VACUUM, 1988, 38 (8-10) : 857 - 859