DIRECT OBSERVATION OF SIH3 ON A 1-PERCENT-HF-TREATED SI(111) SURFACE BY SCANNING TUNNELING MICROSCOPY

被引:70
作者
MORITA, Y
MIKI, K
TOKUMOTO, H
机构
[1] Electrotechnical Laboratory, Tsukuba, Ibaraki 305
关键词
D O I
10.1063/1.105304
中图分类号
O59 [应用物理学];
学科分类号
摘要
Scanning tunneling microscopy (STM) has been made on an as-prepared Si(111) surface by the 1%-HF treatment. The STM images for both the empty and filled states exhibit regular dots with the threefold symmetry on the flat parts of the surface: the distance between dots measures 2.2 angstrom. The origin of these dots can be ascribed to the H atoms of the trihydride (SiH3) phase on the Si(111) surface. The electrons can tunnel from or to the tail states of the sigma (filled) states or the sigma* (empty) states around the H atoms for the SiH3 radicals, respectively.
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页码:1347 / 1349
页数:3
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