CHEMICAL-CHANGES ACCOMPANYING FACET DEGRADATION OF ALGAAS QUANTUM-WELL LASERS

被引:20
作者
HOULE, FA
NEIMAN, DL
TANG, WC
ROSEN, HJ
机构
[1] IBM Research Division, Almaden Research Center, San Jose, CA 95120
关键词
D O I
10.1063/1.352363
中图分类号
O59 [应用物理学];
学科分类号
摘要
The temperature of single quantum well semiconductor laser facets increases during operation, eventually reaching a critical temperature, thermal runaway, and catastrophic optical damage. A study of changes in composition of the near-surface region of facets which accompany heating has been carried out for continuously operated, uncoated AlGaAs-GaAs-AlGaAs graded index separately confined heterostructure single quantum well lasers. High resolution depth profiles by scanning Auger microscopy show that the laser facets can be quite variable in initial composition, and undergo pronounced stoichiometry changes even during the first few minutes of operation. At longer times a continuing out-migration of the group III elements is observed. Unlike the double heterojunction lasers, facet oxidation is not pronounced and is not responsible for diffusion of Ga and Al. There are indications, however, that a slow leakage of oxygen into the crystal may occur. Spatially resolved analyses provide evidence that carrier-mediated elemental redistribution is an important factor in facet degradation. The progressive accumulation of defects which may act as non-radiative recombination centers provides a simple means of facet heating. Analyses of lasers which have suffered catastrophic damage indicate that the facets are not always melted, and that there is no typical chemical state which distinguishes them from facets of lasers which are fully operational. These results are compared to studies of facet degradation in double heterojunction lasers. Implications of the data for models of catastrophic optical damage are discussed.
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页码:3884 / 3896
页数:13
相关论文
共 63 条
[1]   GAAS, ALAS, AND ALXGA1-XAS - MATERIAL PARAMETERS FOR USE IN RESEARCH AND DEVICE APPLICATIONS [J].
ADACHI, S .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (03) :R1-R29
[2]   QUANTITATIVE-ANALYSIS OF ALXGA1-XAS BY AUGER-ELECTRON SPECTROSCOPY [J].
ARTHUR, JR ;
LEPORE, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (04) :979-984
[3]   MAPPING OF LOCAL TEMPERATURES ON MIRRORS OF GAAS/ALGAAS LASER-DIODES [J].
BRUGGER, H ;
EPPERLEIN, PW .
APPLIED PHYSICS LETTERS, 1990, 56 (11) :1049-1051
[4]   CW LASER IRRADIATION OF GAAS - ARSENIC FORMATION AND PHOTOLUMINESCENCE DEGRADATION [J].
CAMPBELL, IH ;
FAUCHET, PM .
APPLIED PHYSICS LETTERS, 1990, 57 (01) :10-12
[5]  
CHINONE N, 1977, J APPL PHYS, V48, P160
[6]   MECHANISM OF GAAS ANODIZATION [J].
COLEMAN, DJ ;
SHAW, DW ;
DOBROTT, RD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (02) :239-241
[7]  
DAVIS LE, 1978, HDB AUGER ELECTRON S
[8]   INTERFACE RECOMBINATION IN P-TYPE GAAS-(ALGA)AS QUANTUM WELL HETEROSTRUCTURES [J].
DUGGAN, G ;
RALPH, HI ;
ELLIOTT, RJ .
SOLID STATE COMMUNICATIONS, 1985, 56 (01) :17-20
[9]  
EPPERLEIN PW, 1990, I PHYS C SER, V112, P633
[10]   OPTICALLY ENHANCED OXIDATION OF III-V COMPOUND SEMICONDUCTORS [J].
FUKUDA, M ;
TAKAHEI, K .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (01) :129-134