MODEL OF THE DISSOLUTION OF MONO-MOLECULAR PHOTORESISTS

被引：4

作者：

BARRAUD, A

机构：

来源：

THIN SOLID FILMS | 1981年 / 85卷 / 01期

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D O I：

10.1016/0040-6090(81)90057-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：77 / 85

页数：9

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[9] Ueberreiter K., 1968, Diffusion in Polymers, P219