VOLTAGE DEPENDENCE OF PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY

被引：32

作者：

KYSER, DF

TING, CH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570288

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1759 / 1763

页数：5

共 13 条

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[3]

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[4]

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[5] MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY [J].

KYSER, DF ;

VISWANATHAN, NS .

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[6]

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[7]

KYSER DF, UNPUBLISHED

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TING, CH .

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[9] ENERGY DEPOSITION FUNCTIONS IN ELECTRON RESIST FILMS ON SUBSTRATES [J].

PARIKH, M ;

KYSER, DF .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :1104-1111

[10] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY [J].

PARIKH, M .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) :4371-4377

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