DEPTH PROFILES OF LI IONS IMPLANTED IN THE PHOTORESIST AZ111

被引：15

作者：

GUIMARAES, RB

AMARAL, L

BEHAR, M

FINK, D

ZAWISLAK, FC

机构：

来源：

JOURNAL OF MATERIALS RESEARCH | 1988年 / 3卷 / 06期

关键词：

D O I：

10.1557/JMR.1988.1422

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1422 / 1426

页数：5

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[6] MASS AND ENERGY-DEPENDENCE OF IMPLANTED ION PROFILES IN THE AZ111 PHOTORESIST [J].

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