PLASMA UNIFORMITY IN HIGH-DENSITY INDUCTIVELY-COUPLED PLASMA TOOLS

被引:97
作者
STEWART, RA
VITELLO, P
GRAVES, DB
JAEGER, EF
BERRY, LA
机构
[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720
[2] OAK RIDGE NATL LAB,OAK RIDGE,TN 37831
[3] LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94550
关键词
D O I
10.1088/0963-0252/4/1/005
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A two-dimensional (r, z) fluid model is used to study plasma transport in inductively coupled plasmas (ICPS). Electron heating from external RF coils driven at 2 MHz is calculated self-consistently by solving for the time-averaged RF electric field. Radial plasma uniformity has been studied in both high (R/L = 2.5) and low (R/L = 1) aspect ratio ICP reactors driven with external planar or cylindrical coils. The effect of neutral gas pressure on plasma uniformity is presented for Ar discharges at 5 and 20m Torr. The location of external coils and corresponding power deposition profile is predicted to have little effect on uniformity except at higher pressure (great-or-similar-to 20 mTorr) and for large aspect ratios. Planar coils appear superior to cylindrical coils for achieving relatively consistent uniformity over a wide range of pressures and reactor aspect ratios.
引用
收藏
页码:36 / 46
页数:11
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