CRITICAL PARAMETERS IN THE SINGLE-TARGET SPUTTERING OF YBA2CU3O7

被引:68
作者
GAVALER, JR
TALVACCHIO, J
BRAGGINS, TT
FORRESTER, MG
GREGGI, J
机构
[1] Westinghouse Science and Technology Center, Pittsburgh, PA 15235
关键词
D O I
10.1063/1.349120
中图分类号
O59 [应用物理学];
学科分类号
摘要
The critical parameters in the single-target magnetron sputtering of YBa2Cu3O7 have been identified and sufficiently optimized to allow the reproducible deposition of films with T(c)'s of > 90 K and J(c)'s of >> 10(6) A/cm2 at 77 K. It was found that during film growth the bombardment of the YBa2Cu3O7 by energetic particles must be minimized and also a stronger oxidizing agent than molecular oxygen must be present to obtain films with these properties. Otherwise, films are deposited that, by x-ray diffraction and energy dispersive x-ray spectroscopy analyses, are indistinguishable from the highest-T(c) 1:2:3 stoichiometric material but which have critical temperatures of << 90 K. Films need not have 1:2:3 overall stoichiometry to have optimum superconducting properties. In such cases the excess elements are present as second-phase particles.
引用
收藏
页码:4383 / 4391
页数:9
相关论文
共 12 条
[1]   INSITU FORMATION OF SUPERCONDUCTING YBA2CU3O7-X THIN-FILMS USING PURE OZONE VAPOR OXIDATION [J].
BERKLEY, DD ;
JOHNSON, BR ;
ANAND, N ;
BEAUCHAMP, KM ;
CONROY, LE ;
GOLDMAN, AM ;
MAPS, J ;
MAUERSBERGER, K ;
MECARTNEY, ML ;
MORTON, J ;
TUOMINEN, M ;
ZHANG, YJ .
APPLIED PHYSICS LETTERS, 1988, 53 (20) :1973-1975
[2]  
BRAGGINS TT, UNPUB
[3]   INSITU GROWN YBA2CU3O7-D THIN-FILMS FROM SINGLE-TARGET MAGNETRON SPUTTERING [J].
EOM, CB ;
SUN, JZ ;
YAMAMOTO, K ;
MARSHALL, AF ;
LUTHER, KE ;
GEBALLE, TH ;
LADERMAN, SS .
APPLIED PHYSICS LETTERS, 1989, 55 (06) :595-597
[4]   OPTIMIZATION OF TC AND JC IN SPUTTERED YBCO FILMS [J].
GAVALER, JR ;
TALVACCHIO, J .
PHYSICA B, 1990, 165 :1513-1514
[5]   CORRELATION BETWEEN THE INSITU GROWTH-CONDITIONS OF YBCO THIN-FILMS AND THE THERMODYNAMIC STABILITY-CRITERIA [J].
HAMMOND, RH ;
BORMANN, R .
PHYSICA C, 1989, 162 :703-704
[6]   INSITU GROWTH OF Y1BA2CU3O7-X FILMS BY MOLECULAR-BEAM EPITAXY WITH AN ACTIVATED OXYGEN SOURCE [J].
KWO, J ;
HONG, M ;
TREVOR, DJ ;
FLEMING, RM ;
WHITE, AE ;
MANNAERTS, JP ;
FARROW, RC ;
KORTAN, AR ;
SHORT, KT .
PHYSICA C, 1989, 162 :623-624
[7]   INSITU PREPARATION OF Y-BA-CU-O SUPERCONDUCTING THIN-FILMS BY MAGNETRON SPUTTERING [J].
LI, HC ;
LINKER, G ;
RATZEL, F ;
SMITHEY, R ;
GEERK, J .
APPLIED PHYSICS LETTERS, 1988, 52 (13) :1098-1100
[8]   DIRECT PRODUCTION OF CRYSTALLINE SUPERCONDUCTING THIN-FILMS OF YBA2CU3O7 BY HIGH-PRESSURE OXYGEN SPUTTERING [J].
POPPE, U ;
SCHUBERT, J ;
ARONS, RR ;
EVERS, W ;
FREIBURG, CH ;
REICHERT, W ;
SCHMIDT, K ;
SYBERTZ, W ;
URBAN, K .
SOLID STATE COMMUNICATIONS, 1988, 66 (06) :661-665
[9]  
ROSSNAGEL SM, 1988, THIN FILM PROCESSING, P106
[10]   RELIABLE SINGLE-TARGET SPUTTERING PROCESS FOR HIGH-TEMPERATURE SUPERCONDUCTING FILMS AND DEVICES [J].
SANDSTROM, RL ;
GALLAGHER, WJ ;
DINGER, TR ;
KOCH, RH ;
LAIBOWITZ, RB ;
KLEINSASSER, AW ;
GAMBINO, RJ ;
BUMBLE, B ;
CHISHOLM, MF .
APPLIED PHYSICS LETTERS, 1988, 53 (05) :444-446