X-RAYS IN ELECTRON-CYCLOTRON-RESONANCE PROCESSING PLASMAS

被引：6

作者：

CASTAGNA, TJ

SHOHET, JL

DENTON, DD

HERSHKOWITZ, N

机构：

[1] Engineering Research Center for Plasma-Aided Manufacturing, University of Wisconsin, Madison

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 23期

关键词：

D O I：

10.1063/1.106846

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron-cyclotron-resonance processing plasmas have been shown to produce low-energy x rays. X radiation was detected in nitrogen and CF4 plasmas from energies of 1-17 keV for microwave powers up to 1000 W. The x-ray flux decreased with increasing pressure over the range of 0.5-3.5 mTorr. Temperatures of the hot electrons responsible for creating the x rays were estimated from the slopes of the x-ray spectra and decreased with increasing pressure. The measured x-ray flux decreased substantially when the magnetic field configuration was changed. Measurable x radiation is produced whenever a field line that passes through the cyclotron resonance surface intersects the vacuum chamber walls and/or other solid surfaces inside the source chamber.

引用

页码：2856 / 2858

页数：3

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