ONE-TRANSISTOR GAAS MESFET-ACCESSED AND JFET-ACCESSED DYNAMIC RAM CELLS FOR HIGH-SPEED MEDIUM DENSITY APPLICATIONS

被引:15
作者
DUNGAN, TE [1 ]
NEUDECK, PG [1 ]
MELLOCH, MR [1 ]
COOPER, JA [1 ]
机构
[1] PURDUE UNIV,SCH ELECT ENGN,W LAFAYETTE,IN 47907
关键词
16;
D O I
10.1109/16.55743
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The introduction of digital GaAs into modern computing systems has lead to increasing demand for high-density memory in these GaAs technologies. To date, most of the memory development efforts in GaAs have been directed toward four- and six-transistor static RAM's, which consume substantial chip area and dissipate much static-power. This paper discusses theoretical and experimental work that presents the possibility for a high-speed, Ion-power one-transistor room-temperature dynamic RAM technology in GaAs. Isolated storage capacitors have demonstrated over 20 min of storage time at room temperature with charge densities comparable to that obtained with planar silicon technology. One-transistor MESFET- and JFET-accessed DRAM cells have been fabricated and operated at room temperature and above. The standby power dissipation of these first cells is only a small fraction of the power dissipated by the best commercial GaAs SRAM cells. © 1990 IEEE
引用
收藏
页码:1599 / 1607
页数:9
相关论文
共 16 条
  • [1] FIELD-ENHANCED CARRIER GENERATION IN MOS CAPACITORS
    CALZOLARI, PU
    GRAFFI, S
    MORANDI, C
    [J]. SOLID-STATE ELECTRONICS, 1974, 17 (10) : 1001 - 1011
  • [2] A SUBTHRESHOLD CURRENT MODEL FOR GAAS-MESFETS
    CHANG, CTM
    VROTSOS, T
    FRIZZELL, MT
    CARROLL, R
    [J]. IEEE ELECTRON DEVICE LETTERS, 1987, 8 (02) : 69 - 72
  • [3] SURVEY OF HIGH-DENSITY DYNAMIC RAM CELL CONCEPTS
    CHATTERJEE, PK
    TAYLOR, GW
    EASLEY, RL
    FU, HS
    TASCH, AF
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (06) : 827 - 838
  • [4] SUBTHRESHOLD CURRENT IN GAAS-MESFETS
    CONGER, J
    PECZALSKI, A
    SHUR, MS
    [J]. IEEE ELECTRON DEVICE LETTERS, 1988, 9 (03) : 128 - 129
  • [5] A THERMAL-GENERATION-LIMITED BURIED-WELL STRUCTURE FOR ROOM-TEMPERATURE GAAS DYNAMIC RAMS
    DUNGAN, TE
    COOPER, JA
    MELLOCH, MR
    [J]. IEEE ELECTRON DEVICE LETTERS, 1987, 8 (05) : 243 - 245
  • [6] DUNGAN TE, 1989, THESIS PURDUE U W LA
  • [7] Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647
  • [8] EFFECT OF SURFACE RECOMBINATION ON CURRENT IN ALXGA1-XAS HETEROJUNCTIONS
    HENRY, CH
    LOGAN, RA
    MERRITT, FR
    [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (06) : 3530 - 3542
  • [9] PHYSICAL LIMITS OF VLSI DRAMS
    LEWYN, LL
    MEINDL, JD
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) : 311 - 321
  • [10] LOW LEAKAGE CURRENT GAAS DIODES
    LOH, KW
    SCHRODER, DK
    CLARKE, RC
    ROHATGI, A
    ELDRIDGE, GW
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (07) : 796 - 800