MOSSBAUER STUDY OF AMORPHOUS THIN FE-SI FILMS PRODUCED BY ION MIXING

被引：3

作者：

HAYASHI, N ^{[1
]}

SAKAMOTO, I ^{[1
]}

TANOUE, H ^{[1
]}

TORIYAMA, T ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,MEGURO KU,TOKYO 152,JAPAN

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1988年 / 106卷 / 04期

关键词：

D O I：

10.1080/00337578808225706

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：265 / 270

页数：6

共 11 条

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