NIAL3 FORMATION IN AL/NI THIN-FILM BILAYERS WITH AND WITHOUT CONTAMINATION

被引：71

作者：

MA, E ^{[1
]}

NICOLET, MA ^{[1
]}

NATHAN, M ^{[1
]}

机构：

[1] MARTIN MARIETTA CORP LABS,BALTIMORE,MD 21227

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 07期

关键词：

D O I：

10.1063/1.342756

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2703 / 2710

页数：8

共 27 条

[1]

[Anonymous], 1967, HDB LATTICE SPACINGS

[2]

[Anonymous], ION BEAM SURFACE LAY

[3]

Baglin J.E.E., 1978, THIN FILMS INTERDIFF

[4]

Colgan E. G., 1986, Journal of Materials Research, V1, P786, DOI 10.1557/JMR.1986.0786

[5] INITIAL PHASE FORMATION AND DISSOCIATION IN THE THIN-FILM NI/AL SYSTEM [J].

COLGAN, EG ;

NASTASI, M ;

MAYER, JW .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4125-4129

[6] DIFFUSION MARKERS IN AL/METAL THIN-FILM REACTIONS [J].

COLGAN, EG ;

MAYER, JW .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 17 (03) :242-249

[7]

COLGAN EG, 1988, MATER RES SOC S P, V119

[8] GROWTH-KINETICS OF PLANAR BINARY DIFFUSION COUPLES - THIN-FILM CASE VERSUS BULK CASES [J].

GOSELE, U ;

TU, KN .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) :3252-3260

[9]

KATZ A, IN PRESS E MRS S A P

[10] ANOMALOUS GROWTH OF HFAL3 IN THIN-FILMS [J].

LEVER, RF ;

HOWARD, JK ;

CHU, WK ;

SMITH, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :158-161

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